this post was submitted on 25 Jan 2026
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A joint Chinese-US research team says it has developed a new semiconductor manufacturing method that it says could “open up entirely new avenues” to develop high-performance light-emitting and integrated devices. The process would surpass conventional lithography machines, which are the main way today of making the semiconductors used in most electronics. When a lithography machine etches a chip circuit, the laser strikes the material vertically. If light goes sideways, it causes uncontrolled...


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